Atomistic simulation of nanoscale MOSFETs in the ballistic regime of operation

dc.contributor.guideMathew, Vincenten_US
dc.coverage.spatialPhysicsen_US
dc.creator.researcherJames, T Georgeen_US
dc.date.accessioned2014-09-25T06:57:15Z
dc.date.available2014-09-25T06:57:15Z
dc.date.awarded23/05/2012en_US
dc.date.completed15/06/2011en_US
dc.date.issued2014-09-25
dc.date.registered09/01/2007en_US
dc.description.abstractnewlineen_US
dc.description.noteBibliography p. 127-140en_US
dc.format.accompanyingmaterialNoneen_US
dc.format.dimensionsen_US
dc.format.extentxix, 140p.en_US
dc.identifier.urihttp://hdl.handle.net/10603/25769
dc.languageEnglishen_US
dc.publisher.institutionSt. Thomas Collegeen_US
dc.publisher.placeKottayamen_US
dc.publisher.universityMahatma Gandhi Universityen_US
dc.relationen_US
dc.rightsuniversityen_US
dc.source.universityUniversityen_US
dc.subject.keywordBallistic operationen_US
dc.subject.keywordMetal oxide semiconductor field effect transistorsen_US
dc.subject.keywordMOSFETen_US
dc.titleAtomistic simulation of nanoscale MOSFETs in the ballistic regime of operationen_US
dc.title.alternativeen_US
dc.type.degreePh.D.en_US

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