Depositing and characterized Tungsten nitride by reactive sputtering method

dc.contributor.guide	Khetarpal, Monika
dc.coverage.spatial	Science
dc.creator.researcher	Singh, Sukhvir
dc.date.accessioned	2020-09-07T05:14:18Z
dc.date.available	2020-09-07T05:14:18Z
dc.date.awarded	n.d.
dc.date.completed	2009-10
dc.date.registered	n.d.
dc.description.abstract	newline Abstract not available newline
dc.description.note	Bibliography p. 66-67
dc.format.accompanyingmaterial	None
dc.format.dimensions	-
dc.format.extent	67p.
dc.identifier.uri	http://hdl.handle.net/10603/297963
dc.language	English
dc.publisher.institution	Department of Physics
dc.publisher.place	Bikaner
dc.publisher.university	Maharaja Ganga Singh University
dc.relation	No of references 15
dc.rights	university
dc.source.university	University
dc.subject.keyword	Depositing
dc.subject.keyword	Physical Sciences
dc.subject.keyword	Physics
dc.subject.keyword	Physics Applied
dc.title	Depositing and characterized Tungsten nitride by reactive sputtering method
dc.title.alternative	-
dc.type.degree	M.Phil.