Growth and characterization of vacuum deposited stoichiometric films of sulphide semiconductors

dc.contributor.guide	Singh, Beer pal	en_US
dc.coverage.spatial	Physics	en_US
dc.creator.researcher	Rakesh Kumar	en_US
dc.date.accessioned	2015-02-16T11:05:24Z
dc.date.available	2015-02-16T11:05:24Z
dc.date.awarded	n.d.	en_US
dc.date.completed	2013	en_US
dc.date.issued	2015-02-16
dc.date.registered	n.d.	en_US
dc.description.abstract	None newline	en_US
dc.description.note	Conclusion p,175-183,	en_US
dc.format.accompanyingmaterial	None	en_US
dc.format.dimensions	30cm	en_US
dc.format.extent	xi, 186p,	en_US
dc.identifier.uri	http://hdl.handle.net/10603/35332
dc.language	English	en_US
dc.publisher.institution	Department of Physics	en_US
dc.publisher.place	Meerut	en_US
dc.publisher.university	Chaudhary Charan Singh University	en_US
dc.relation	None	en_US
dc.rights	university	en_US
dc.source.university	University	en_US
dc.subject.keyword	Growth	en_US
dc.subject.keyword	Characterization	en_US
dc.subject.keyword	Deposited Stoichiometric	en_US
dc.subject.keyword	Sulphide Semiconductors	en_US
dc.title	Growth and characterization of vacuum deposited stoichiometric films of sulphide semiconductors	en_US
dc.title.alternative		en_US
dc.type.degree	Ph.D.	en_US