Development and characterization of novel masking materials _polymers_ for silicon micromachining

dc.contributor.guide	Gangal, S A
dc.coverage.spatial	Electronic Science
dc.creator.researcher	Bodas, Dhananjay S
dc.date.accessioned	2017-02-02T12:03:35Z
dc.date.available	2017-02-02T12:03:35Z
dc.date.awarded	n.d.
dc.date.completed	2004
dc.date.registered	n.d
dc.description.abstract	Abstract not available newline newline
dc.description.note	-
dc.format.accompanyingmaterial	None
dc.format.dimensions	-
dc.format.extent	179p.
dc.identifier.uri	http://hdl.handle.net/10603/133563
dc.language	English
dc.publisher.institution	Department of Electronic Science
dc.publisher.place	Pune
dc.publisher.university	Savitribai Phule Pune University
dc.relation	-
dc.rights	university
dc.source.university	University
dc.subject.keyword	Micromachining, Fourier transform infrared spectroscopy, Pmma films, Re sputtering, Xps analysis
dc.title	Development and characterization of novel masking materials _polymers_ for silicon micromachining
dc.title.alternative	-
dc.type.degree	Ph.D.