Formation and characterization of some metal _ semiconductor interfaces

dc.contributor.guideKulkarni, S K
dc.coverage.spatialPhysics
dc.creator.researcherGokhale, Shubha Mukund
dc.date.accessioned2017-01-24T05:27:17Z
dc.date.available2017-01-24T05:27:17Z
dc.date.awardedn.d.
dc.date.completedn.d
dc.date.registeredn.d.
dc.description.abstractAbstract not available newline newline
dc.description.note-
dc.format.accompanyingmaterialNone
dc.format.dimensions-
dc.format.extentii, 129P.
dc.identifier.urihttp://hdl.handle.net/10603/126052
dc.languageEnglish
dc.publisher.institutionDepartment of Physics
dc.publisher.placePune
dc.publisher.universitySavitribai Phule Pune University
dc.relation-
dc.rightsuniversity
dc.source.universityUniversity
dc.subject.keywordMechanism of schottky, Chemical aspects, Capacitance-voltage, Photoelectron measurement, XPS analysis
dc.titleFormation and characterization of some metal _ semiconductor interfaces
dc.title.alternative-
dc.type.degreePh.D.

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