ECR based plasma assisted chemical etching of semiconductors

dc.contributor.guide	Bharadwaj, Lalit M
dc.coverage.spatial	Physics
dc.creator.researcher	Bhardwaj, Ram Krishan
dc.date.accessioned	2016-04-19T05:21:43Z
dc.date.available	2016-04-19T05:21:43Z
dc.date.awarded	n.d.
dc.date.completed	31/12/2006
dc.date.registered	n.d.
dc.description.abstract	Abstract available
dc.description.note	Data not available
dc.format.accompanyingmaterial	None
dc.format.dimensions	72cm.
dc.format.extent	ix, 90p.
dc.identifier.uri	http://hdl.handle.net/10603/82951
dc.language	English
dc.publisher.institution	Department of Physics
dc.publisher.place	Chandigarh
dc.publisher.university	Panjab University
dc.relation	Reference available at chapters
dc.rights	university
dc.source.university	University
dc.subject.keyword	Cyclotron
dc.subject.keyword	Electron
dc.subject.keyword	Etching
dc.subject.keyword	Plasma
dc.subject.keyword	Semiconductors
dc.title	ECR based plasma assisted chemical etching of semiconductors
dc.title.alternative
dc.type.degree	Ph.D.