Studies On The Basic Interaction And The Dosimetric Properties Of Unflattened Megavoltage X Ray Beam With High Z Implant Materials And Its Imaging Benefits

dc.contributor.guide	Ramesh Babu P
dc.coverage.spatial
dc.creator.researcher	Tamilarasan R
dc.date.accessioned	2023-01-30T09:03:15Z
dc.date.available	2023-01-30T09:03:15Z
dc.date.awarded	2022
dc.date.completed	2022
dc.date.registered	2012
dc.description.abstract	newline
dc.description.note
dc.format.accompanyingmaterial	None
dc.format.dimensions
dc.format.extent	1-145
dc.identifier.uri	http://hdl.handle.net/10603/454714
dc.language	English
dc.publisher.institution	School of Advanced Sciences
dc.publisher.place	Vellore
dc.publisher.university	Vellore Institute of Technology (VIT) University
dc.relation
dc.rights	university
dc.source.university	University
dc.subject.keyword	Physical Sciences
dc.subject.keyword	Physics
dc.subject.keyword	Physics Multidisciplinary
dc.title	Studies On The Basic Interaction And The Dosimetric Properties Of Unflattened Megavoltage X Ray Beam With High Z Implant Materials And Its Imaging Benefits
dc.title.alternative
dc.type.degree	Ph.D.