Antireflection coating with modified spin coater to increase the efficiency of solar cells

Abstract

The objective of this research is fabrication of spin coater with annealing newlineprocess which helps to increase the performance of solar cells. Spin coating newlineis mainly used for coating solution thin layer films on electronic industry and newlinealso for antireflection coating on solar cells. In this paper also spin coating is newlineused as applications for solar antireflection coating. The thickness of the thin newlinefilm is depends on spinning speed, viscosity orate of evaporation of coated newlinefilm, the drawback of the existing design is, separate drying process. Due to newlinethis, rate of evaporation is delayed which results increased thin film thickness. newlineTo overcome this disadvantage, the proposed fabricated design is built with newlinedrying process. In this the coated film is dried with in the device. The coating newlinematerial solution is dumped onto the substrate and turned off at a high newlinevelocity in the 1000 8000 rpm range, leaving a uniform layer The fine tuning newlinetechnique of modified spin coating device to coat the Zinc oxide (ZnO) and newlineTiO2 solution on solar cell to increase the efficiency of the solar cell. The newlineTaguchi method is used to find the optimal process parameter combinations newlinefor realizing lower film thickness. Here the 9 samples from different parametric newlineconditions such as spinning speed, spinning time and quantity of solution. The newlinemost acceptable settings of the parameters that time of 3 secs then spin at newlinethe speed of 2000 rpm for 3 micro litre of ZnO solution at 15 secs at the newlinedesired thickness and uniformity of 0.38 micro meter have been attained by newlinestudying the primary impact plot of signal to noise ratio SNR. The newlineexperimental results process parameters and response parameter were newlineinvestigated by Analysis of Variance (ANOVA) technique. When increasing newlinethe rate of evaporation instantly in the spin coater which results in smooth and newlineuniform thin film. Surface of the layer and availability of solution is determined newlineby using the Scanning electron microscopy (SEM) method respectively.