Investigation of codoped hafnia thin films for device applications

dc.contributor.guide	Rao, Mohan K
dc.coverage.spatial	Physics
dc.creator.researcher	Sabhya
dc.date.accessioned	2025-02-10T05:54:38Z
dc.date.available	2025-02-10T05:54:38Z
dc.date.awarded	2024
dc.date.completed	2024
dc.date.registered	2021
dc.description.abstract	Available newline
dc.description.note	bibliography p.206-212
dc.format.accompanyingmaterial	None
dc.format.dimensions	-
dc.format.extent	222p.
dc.identifier.researcherid
dc.identifier.uri	http://hdl.handle.net/10603/620983
dc.language	English
dc.publisher.institution	Manipal Institute of Technology
dc.publisher.place	Manipal
dc.publisher.university	Manipal Academy of Higher Education
dc.relation	No.of references 97
dc.rights	university
dc.source.university	University
dc.subject.keyword	HfO2 films
dc.subject.keyword	MOS Capacitors, Spin coating
dc.subject.keyword	Oxygen vacancies
dc.title	Investigation of codoped hafnia thin films for device applications
dc.title.alternative	-
dc.type.degree	Ph.D.