Raman study of Ion Implanted and Laser Annealed Silicon

dc.contributor.guide	Abbi, S.C. and Jain, K.P.
dc.coverage.spatial	Department of Physics
dc.creator.researcher	Shukla, Aniruddha Kumar
dc.date.accessioned	2025-05-16T10:37:14Z
dc.date.available	2025-05-16T10:37:14Z
dc.date.awarded	1986
dc.date.completed	1986
dc.date.registered
dc.description.abstract	newline
dc.description.note
dc.format.accompanyingmaterial	DVD
dc.format.dimensions
dc.format.extent
dc.identifier.researcherid
dc.identifier.uri	http://hdl.handle.net/10603/639662
dc.language	English
dc.publisher.institution	Department of Physics
dc.publisher.place	Delhi
dc.publisher.university	Indian Institute of Technology Delhi
dc.relation	TH1515
dc.rights	university
dc.source.university	University
dc.subject.keyword	Physical Sciences
dc.subject.keyword	Physics
dc.subject.keyword	Physics Applied
dc.title	Raman study of Ion Implanted and Laser Annealed Silicon
dc.title.alternative
dc.type.degree	Ph.D.